Collective Die to Wafer Bonding System

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Wafer Bonding System
Collective Die to Wafer Bonding System

Collective Die to Wafer Bonding system

Chip to Wafer bonding ์žฅ๋น„์ธ Thermal Compression Chip Bonder ์˜ ์ƒ์‚ฐ์„ฑ์„ ๋†’์ด๊ธฐ ์œ„ํ•˜์—ฌ Device Wafer ์ „๋ฉด์— Chip์„ P&P ํ•œ ๋‹ค์Œ ํ•œ๊บผ๋ฒˆ์— Press ํ•˜์—ฌ Chip์„ ์ ์ธต/์ „๊ธฐ์  ์—ฐ๊ฒฐ์„ ํ•˜๋Š” Gang Bonding ์žฅ๋น„์ž…๋‹ˆ๋‹ค.


๋‹ค๋ฅธ ๋ฐฉ๋ฒ•์€ Carrier Wafer ์ „๋ฉด์— Chip์„ P&P ์ „์‚ฌํ•œ ๋‹ค์Œ, Carrier Wafer์ƒ์˜ Chip๋“ค๊ณผ ๋‹ค๋ฅธ Device Wafer์˜ Chip๋“ค์„ ๊ฐ€์ ‘ํ•ฉํ•˜๋Š” Aligner & Pre-bonder์™€, ๋ณธ ์ ‘ํ•ฉํ•˜๋Š” Thermal compression Wafer bonder  ์™€ Laser Eutectic Bonder๊ฐ€ ์žˆ์Šต๋‹ˆ๋‹ค.


์ „๊ธฐ์  ์—ฐ๊ฒฐ์€ ๋‚ฎ์€ ์œต์ ์˜ ์ „๊ทน์„ ์‚ฌ์šฉํ•˜์—ฌ Bump to ์ „๊ทน ๋˜๋Š” ์ „๊ทน to ์ „๊ทน ๊ฐ„ Eutectic Bonding์„ ํ•ฉ๋‹ˆ๋‹ค.

  Features

  • Post Bonding after Aligning & Pre-bonding 
  • Electrode metal/Bump:  Cu, Au, Sn, CuSn, AuSn, AgSn                          
  • Automatic Parallelism adjustment function  : Excellent pressing uniformity
  • Anti – Vibration Structure

  Specifications

  • Wafer Size : up to 12inch
  • Aligner & Pre-bonder in vacuum or atm.

             - Align Accuracy :  ≤±2um

             - Throughput : 15 wafers/h


  • Post Bonder(Gang Bonder) :

              - Throughput of Thermal compression wafer bonder : 3 wafers/h

              - Throughput of Laser Eutectic bonder : 20 wafers/h



์ฝ”์Šคํ…์‹œ์Šคํ…œ(์ฃผ) ๊ฒฝ๊ธฐ๋„ ํ‰ํƒ์‹œ ์„œํƒ„๋ฉด ๋ฐฉ๊ผฌ์ง€๊ธธ 231

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