Vacuum Cluster System

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Wafer Transfer System

OPTIMA Series

OPTIMA ์‹œ๋ฆฌ์ฆˆ๋Š” ์šฐ์ˆ˜ํ•œ ์„ฑ๋Šฅ๊ณผ ๋†’์€ ์›จ์ดํผ ์ฒ˜๋ฆฌ๋Ÿ‰์— ์ตœ์ ํ™”๋˜์–ด ์žˆ์Šต๋‹ˆ๋‹ค. ํŠนํžˆ ALD์™€ ๊ฐ™์€ ์žฅ์‹œ๊ฐ„ ๊ณต์ • Time์„ ํ•„์š”๋กœ ํ•˜๋Š” ๊ณต์ • ์žฅ๋น„๋ฅผ ๊ตฌ์„ฑํ•˜๋Š”๋ฐ ์ ํ•ฉํ•ฉ๋‹ˆ๋‹ค.

  Features

  • High throughput available with dual transfer module for various processes
  • Suitable for long process time such as ALD
  • Field proven vacuum robot with AWC feature

  Specifications

  • Wafer Placement repeatability : ≤ ± 0.1 mm
  • Base Pressure : 10-3Torr(Available for 10-7Torr)
  • Particle  : ≤ 5 ea @40nm
  • UPEH :   152   wafers/h
  • Compatibility of SEMI / MESC
  • Satisfaction of CE Mark and SEMI S2

์ฝ”์Šคํ…์‹œ์Šคํ…œ(์ฃผ) ๊ฒฝ๊ธฐ๋„ ํ‰ํƒ์‹œ ์„œํƒ„๋ฉด ๋ฐฉ๊ผฌ์ง€๊ธธ 231

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