TWINSTAR Series

TWINSTAR는 우수한 성능과 높은 웨이퍼 처리량으로 최적화된 트윈 웨이퍼 공정을 위해 설계되었습니다. 최대 3개의 트윈 공정 모듈을 구성할 수 있습니다.

  Features

• High throughput and reliability by specially designed 7-axis vacuum robot with AWC
• Duplex design and high throughput load lock chamber
• Wafer pre-heating unit(option)
• Suitable for CVD, Dry Etch and ALD processes
• Compatibility of SEMI / MESC
• Satisfaction of CE Mark and SEMI S2

  Specifications

• Wafer placement repeatability : ≤ ± 0.1 mm
• Base Pressure : 10^-3 Torr (Available for 10^-7Torr)
• Particle  : ≤ 5 ea @40nm
• MCBF  : ≥ 100,000 cycles
• UPEH :   307 wafers/h